UVJC is a Singapore‑based deep‑tech equipment company developing next‑generation dry thin‑film printing and deposition technologies. We design and build advanced tools that bridge the gap between R&D and scalable manufacturing, enabling precision, solvent‑free fabrication across semiconductors, electronics, and emerging applications.

Shape the future with us.

Job Purpose:

We are seeking a highly motivated Doctoral Student Characterization Scientist to support the development of UVJC's vapor jet printing technology through advanced thin-film characterization and materials analysis. This role offers a unique opportunity to contribute to cutting-edge research at the intersection of materials science, metrology, advanced manufacturing, and process development.

Key Responsibilities:

• Perform thin-film characterization using techniques such as SEM, AFM, ellipsometry, profilometry, XRD, and related metrology tools.

• Design and execute experiments to evaluate material properties and thin films produced by UVJC's proprietary deposition technologies.

• Analyze characterization data and establish structure-property-process relationships.

• Collaborate with scientists and engineers to support process optimization and equipment development.

• Document experimental findings and contribute to technical reports, publications, conference presentations, and intellectual property generation.

• Support the maintenance, calibration, and continuous improvement of laboratory characterization capabilities.

Skills:

• Familiarity with thin-film characterization and materials analysis techniques.

• Strong analytical and problem-solving skills.

• Experience with scientific data analysis and statistical methods.

• Excellent technical communication and collaboration abilities.

• Ability to work independently while contributing within a multidisciplinary research environment.

Education:

• Currently enrolled in a PhD program in Materials Science, Physics, Chemistry, Chemical Engineering, Nanotechnology, or a related discipline.